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'%3e%3cpath%20style='fill:%2300a0dc;fill-opacity:1;stroke:none;stroke-width:.144606;stroke-opacity:1;stop-color:%23000'%20d='M41.8%20100.088H52.28c.46%200%20.831.421.831.945v10.25c0%20.524-.37.946-.831.946H41.8c-.46%200-.831-.422-.831-.945v-10.251c0-.524.37-.945.831-.945z'/%3e%3cpath%20d='m47.072%20102.02-4.87%202.656%204.87%202.657%203.985-2.174v3.06h.885v-3.543m-7.969%201.851v1.771l3.1%201.691%203.098-1.691v-1.77l-3.099%201.69z'%20style='fill:%23fff;fill-opacity:1;stroke-width:.442726'/%3e%3ccircle%20style='fill:%23009f1d;fill-opacity:1;stroke:%23fff;stroke-width:.379704;stroke-linecap:round;stroke-linejoin:round;stroke-miterlimit:4;stroke-dasharray:none;stroke-opacity:1;stop-color:%23000'%20cx='54.151'%20cy='101.224'%20r='3.451'/%3e%3cpath%20d='m55.669%2099.387.659.664-3.075%203.104-1.634-1.649.66-.663.974.979%202.416-2.435'%20style='fill:%23fff;fill-opacity:1;stroke:none;stroke-width:.30061;stroke-miterlimit:4;stroke-dasharray:none;stroke-opacity:1'/%3e%3c/g%3e%3c/svg%3e)
Structures electriques de controle de l'alignement dans les procedes de fabrication des circuits integres : application a la qualification d'equipement de lithographie avancee
FR |
EN
| Auteur / Autrice : | Agnès Lasne |
| Direction : | Jean Buxo |
| Type : | Thèse de doctorat |
| Discipline(s) : | Micro-électronique |
| Date : | Soutenance en 1987 |
| Etablissement(s) : | Toulouse, INSA |
Mots clés
FR
Mots clés libres
Electronique
Circuit integre
Circuit vlsi
Fabrication microelectronique
Technologie avancee
Lithographie
Alignement
Controle fabrication
Mesure automatique
Propriete electrique
Polycristal
Silicium
Integrated circuit
Vlsi circuit
Microelectronic fabrication
Advanced technology
Lithography
Alignment
Processing control
Automatic measurement
Electrical properties
Polycrystal
Silicon